Projected Range Tables obtained from SRIM have been converted into graphical form for the ion species and films typically used in semiconductor manufacturing. The ions graphed are antimony, arsenic, boron, and phosphorus. The substrate materials being implanted are silicon, silicon dioxide, silicon nitride, and a representative photoresist. These statistics provide the user with estimates of the peak implant depth and the distribution around that peak. INNOViON can help with estimating the projected range statistics of other species and substrate combinations and can help estimate the impact of thermal processing of these species. Please contact us for these and other applications.