Ion Implant Services Expands 8" Processing

July 01, 1998 - San Jose, CA

Sunnyvale, Calif.-- Ion Implant Services (IISSM) announced the installation of Varian's VIISion 200 implanter in its Sunnyvale facility. The system will augment the company's 8" processing capability.


IISSM provides implant services to over 60% of the semiconductor manufacturers in the US. That entails processing wafers of many sizes -- the VIISion's ability to switch rapidly between sizes was a key consideration in choosing this system. "Moving readily between wafer sizes, especially between 6" and 8," states IIS'SM president, Dr. Wes Weisenberger, "is critical to our business. We have demonstrated changing sizes in under four hours -- and this time is improving. The ability to work with our customers in converting from their existing 6" processes to 8" is a big plus."

The VIISion 200 handles both medium and high current applications with doses from 5E11 to 5E16 and at 2 keV to 200 keV energies. This provides broad flexibility to meet various customer implant needs. By design, the system is adept at accurately controlling dose, using real time beam current monitoring and dose integration with a Faraday design that eliminates current leakage. In addition, system pumping reduces neutral generation in the beamline and at the end station, further aiding in accurate dose control.

"The VIISion significantly increase our 8" wafer processing capability," says regional sales manager, Randall Graf. "We look forward to working with customers to develop and promote their 8" implant requirements."