Ion Implant Services Expands 8" Processing Capability With RTP
November 05, 1997 - San Jose, CA
Sunnyvale, Calif. -- Ion Implant Services (IISSM) today announced its purchase of two Eaton Reliance 850 Rapid Thermal Processors. The systems will be used to aid in monitoring dose reproducibility and uniformity at IIS'sSM ion implant operations.
"Because ion implantation greatly affects such important device characteristics as threshold voltage, leakage current, and device lifetime," says IISSM president Wes Weisenberger, "we regularly monitor implanter performance to be sure we provide quality ion implant services to our customers. Eaton's economical 850's provide familiar vertical furnace results, combined with rapid temperature ramping and single wafer safety, making them ideal for our operations. The concept is simple yet elegant."
Ion Implant Services provides outsourced ion implant services to over 60% of the semiconductor manufacturing companies in the US. The quality and dependability of its processing are key to maintaining this customer base and the Eaton systems will augment IIS'SM already stringent process quality control.
IIS'SM operations are in Sunnyvale, California and Austin, Texas where it serves local semiconductor manufacturers with rapid turnaround of their products. "Eaton's widespread spare parts warehousing and ability to provide service back up," continues Weisenberger, "were also key considerations in our purchase of the systems. We are processing 8" wafers and customers can't be kept waiting because monitoring equipment is down."
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